Here a dataset of XPS, HAXPES and SEM measurements for the physico-chemical characterization of nanoparticles is presented. The measurements are part of the H2020 project “NanoSolveIT”.
Sterile Fe3O4 nanoparticles were synthesized under aseptic conditions at Mintek, South Africa (EMR-Identifier in the project: ERM00000583).
Prior to the measurements, the samples were prepared from the solution as drop cast on Si wafers. First SEM measurements were performed, followed by XPS and HAXPES measurements on the same samples. Here at first survey spectra were recorded followed by high resolution spectra. For XPS / HAXPES several Si-wafers were mounted together on one platen. The platen was left in the intro chamber of the instrument for several hours before the measurement started.
Equipment:
SEM images were acquired with a Supra 40 (Zeiss) SEM.
For X-ray spectroscopy experiments, a combined XPS / HAXPES spectrometer (Quantes from ULVAC-PHI) was used, where XPS is measured at 1486.6 eV (monochromatic Al Kα source) and HAXPES at 5414.9 eV (monochromatic Cr Kα source). Here it is possible to perform the measurements at the exact same position.
Data:
For SEM, the data are given in .tif format. For XPS / HAXPES the raw data are given as .spe (PHI format) and .npl (VAMAS format) files. The measurement conditions are given in the data files.
Naming of data:
SEM: sample_treatment (n), with n a consecutive number.
XPS / HAXPES: For the .spe and for the corresponding .npl files Pn.m.o.sample_treatment, with Pn: platen-number, m: spectrum number (order of the measurements); o: point-number, of the position on the sample, sample_treatment with "p" for pristine.
The authors thank Thorid Lange, who performed the SEM measurements.
Not seeing a result you expected?
Learn how you can add new datasets to our index.
Here a dataset of XPS, HAXPES and SEM measurements for the physico-chemical characterization of nanoparticles is presented. The measurements are part of the H2020 project “NanoSolveIT”.
Sterile Fe3O4 nanoparticles were synthesized under aseptic conditions at Mintek, South Africa (EMR-Identifier in the project: ERM00000583).
Prior to the measurements, the samples were prepared from the solution as drop cast on Si wafers. First SEM measurements were performed, followed by XPS and HAXPES measurements on the same samples. Here at first survey spectra were recorded followed by high resolution spectra. For XPS / HAXPES several Si-wafers were mounted together on one platen. The platen was left in the intro chamber of the instrument for several hours before the measurement started.
Equipment:
SEM images were acquired with a Supra 40 (Zeiss) SEM.
For X-ray spectroscopy experiments, a combined XPS / HAXPES spectrometer (Quantes from ULVAC-PHI) was used, where XPS is measured at 1486.6 eV (monochromatic Al Kα source) and HAXPES at 5414.9 eV (monochromatic Cr Kα source). Here it is possible to perform the measurements at the exact same position.
Data:
For SEM, the data are given in .tif format. For XPS / HAXPES the raw data are given as .spe (PHI format) and .npl (VAMAS format) files. The measurement conditions are given in the data files.
Naming of data:
SEM: sample_treatment (n), with n a consecutive number.
XPS / HAXPES: For the .spe and for the corresponding .npl files Pn.m.o.sample_treatment, with Pn: platen-number, m: spectrum number (order of the measurements); o: point-number, of the position on the sample, sample_treatment with "p" for pristine.
The authors thank Thorid Lange, who performed the SEM measurements.